Karouta, F.F.KaroutaJacobs, B.B.JacobsMoerman, I.I.MoermanJacobs, K.K.JacobsWeyher, J.L.J.L.WeyherPorowski, S.S.PorowskiCrane, R.R.CraneHageman, P.R.P.R.Hageman2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4997Highly chemical reactive ion etching of gallium nitrideProceedings paper