Vapor phase deposited total X-ray fluorescence as a means to study copper drift diffusion in low-k dielectrics

Lanckmans, FilipFilipLanckmansArnauts, SophiaSophiaArnautsMaex, KarenKarenMaex2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5426Vapor phase deposited total X-ray fluorescence as a means to study copper drift diffusion in low-k dielectricsOral presentation