Work function of Ni3Si2 on HfSixOy and SiO2 and its implication for Ni fully silicided gate applications

Kittl, JorgeJorgeKittlO'Sullivan, BarryBarryO'SullivanKaushik, VidyaVidyaKaushikLauwers, AnneAnneLauwersPawlak, M.A.M.A.PawlakHoffmann, Thomas Y.Thomas Y.HoffmannDemeurisse, CarolineCarolineDemeurisseVrancken, ChristaChristaVranckenVeloso, AnabelaAnabelaVelosoAbsil, PhilippePhilippeAbsilBiesemans, SergeSergeBiesemans2021-10-162021-10-162007-01https://imec-publications.be/handle/20.500.12860/12405Work function of Ni3Si2 on HfSixOy and SiO2 and its implication for Ni fully silicided gate applicationsJournal article