Schuhmacher, JorgJorgSchuhmacherMartin Hoyas, AnaAnaMartin HoyasErnur, DidemDidemErnurTokei, ZsoltZsoltTokeiTravaly, YoussefYoussefTravalyBruynseraede, ChristopheChristopheBruynseraedeSatta, AlessandraAlessandraSattaWhelan, CarolineCarolineWhelanShamiryan, DenisDenisShamiryanBeyer, GeraldGeraldBeyerAbell, ThomasThomasAbellSutcliffe, VictorVictorSutcliffeSchaekers, MarcMarcSchaekersMaex, KarenKarenMaex2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9574Atomic layer deposited barriers for copper interconnectsMeeting abstract