Line edge and width roughness mitigation at 22nm half pitch: plasma polymer interaction and roughness mitigation through etch

De Schepper, PeterPeterDe SchepperHansen, TerjeTerjeHansenVaglio Pret, AlessandroAlessandroVaglio PretAltamirano Sanchez, EfrainEfrainAltamirano SanchezBoullart, WernerWernerBoullartDe Gendt, StefanStefanDe Gendt2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22218Line edge and width roughness mitigation at 22nm half pitch: plasma polymer interaction and roughness mitigation through etchMeeting abstract