Modeling of clustering reaction and diffusion of boron in strained Si1-xGex epitaxial layers

Krishnasamy, RajendranRajendranKrishnasamyVillaneuva, D.D.VillaneuvaMoens, P.P.MoensSchoenmaker, WimWimSchoenmaker2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7758Modeling of clustering reaction and diffusion of boron in strained Si1-xGex epitaxial layersJournal article