Le, Quoc ToanQuoc ToanLeClaes, MartineMartineClaesConard, ThierryThierryConardKesters, ElsElsKestersLux, MarcelMarcelLuxVereecke, GuyGuyVereecke2021-10-172021-10-1720090167-9317https://imec-publications.be/handle/20.500.12860/15676Removal of post-etch photoresist and sidewall residues using organic solvent and additive combined with physical forcesJournal article