Atomically controlled processing for Si and Ge CVD epitaxial growth

Murota, JunichiJunichiMurotaYamamoto, YuchiYuchiYamamotoCostina, I.I.CostinaTillack, BerndBerndTillackLe Thanh, VinVinLe ThanhLoo, RogerRogerLooCaymax, MattyMattyCaymax2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27058Atomically controlled processing for Si and Ge CVD epitaxial growthMeeting abstracthttp://ma.ecsdl.org/content/MA2016-01/16/988.abstract