Zhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeHeyne, MarkusMarkusHeyneNaumov, SergejSergejNaumovSun, YitingYitingSunZotovich, AlexeyAlexeyZotovichEl Otell, ZiadZiadEl OtellVaida, SelimSelimVaidaDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-232021-10-2320152162-8769https://imec-publications.be/handle/20.500.12860/26240Improved plasma resistance for porous low-k dielectrics by pore stuffing approachJournal articlehttp://jss.ecsdl.org/content/4/1/N3098.abstract