Baklanov, MikhaïlMikhaïlBaklanovVan Hove, MarleenMarleenVan HoveMannaert, GeertGeertMannaertVanhaelemeersch, SergeSergeVanhaelemeerschBender, HugoHugoBenderConard, ThierryThierryConardMaex, KarenKarenMaex2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4092Low temperature oxidation and selective etching of chemical vapor deposition a-SiC:H filmsJournal article