Low damage cryogenic etching of low-k materials for advanced interconnects

Baklanov, MikhaïlMikhaïlBaklanovZhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeDussart, RemiRemiDussartGoodyear, AndyAndyGoodyear2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23517Low damage cryogenic etching of low-k materials for advanced interconnectsMeeting abstract