Detection of split design-related weak points in double patterning using PQW and bright-field defect inspection

Van Den Heuvel, DieterDieterVan Den HeuvelCheng, ShauneeShauneeChengLeray, PhilippePhilippeLerayWiaux, VincentVincentWiauxMaenhoudt, MireilleMireilleMaenhoudtD'have, KoenKoenD'haveJaenen, PatrickPatrickJaenenMarcuccilli, GinoGinoMarcuccilliMalik, IrfanIrfanMalikKlein, SophieSophieKlein2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14627Detection of split design-related weak points in double patterning using PQW and bright-field defect inspectionProceedings paper