Chemical mechanical polishing of manganese (Mn)-based barrier films in the BEOL interconnects for advanced metallization nodes

Sagi, KaushikKaushikSagiBabu, S.V.S.V.Babuvan der Veen, MarleenMarleenvan der VeenStruyf, HerbertHerbertStruyfTeugels, LieveLieveTeugels2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27253Chemical mechanical polishing of manganese (Mn)-based barrier films in the BEOL interconnects for advanced metallization nodesMeeting abstract