Jonckheere, RikRikJonckheereRonse, KurtKurtRonsePhilipsen, VickyVickyPhilipsenLeunissen, PeterPeterLeunissen2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7706Reticle terminology and metrology needs for advanced 193nm and 157nm lithographyOral presentation