Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study

De Schepper, PeterPeterDe SchepperAltamirano Sanchez, EfrainEfrainAltamirano SanchezGoodyear, AndyAndyGoodyearEl Otell, ZiadZiadEl Otellde Marneffe, Jean-FrancoisJean-Francoisde MarneffeDe Gendt, StefanStefanDe Gendt2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23718Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR studyProceedings paper