Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation

Zhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeLeroy, FlorianFlorianLeroyLefaucheux, PhilippePhilippeLefaucheuxTillocher, ThomasThomasTillocherDussart, RemiRemiDussartMaekawa, KaoruKaoruMaekawayatsuda, koichikoichiyatsudaDussarrat, ChristianChristianDussarratGoodyear, AndyAndyGoodyearCooke, MikeMikeCookeDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-232021-10-2320160022-3727https://imec-publications.be/handle/20.500.12860/27660Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensationJournal articlehttp://iopscience.iop.org/article/10.1088/0022-3727/49/17/175203/meta