Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs

Vandenberghe, GeertGeertVandenbergheDriessen, FrankFrankDriessenVan Adrichem, PaulPaulVan AdrichemRonse, KurtKurtRonseLi, JasonJasonLiKarklin, LinardLinardKarklin2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6969Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICsProceedings paper