Vellianitis, G.G.VellianitisPetry, JasmineJasminePetryHooker, JacobJacobHookerDelabie, AnneliesAnneliesDelabieDe Gendt, StefanStefanDe Gendt2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13153Reliability degradation of HfSiO gate dielectric layers: influence of nitridationJournal article