Delabie, AnneliesAnneliesDelabieCaymax, MattyMattyCaymaxBrijs, BertBertBrijsCartier, E.E.CartierGeenen, LucLucGeenenVandervorst, WilfriedWilfriedVandervorstBajolet, PhilippePhilippeBajoletMaes, JanJanMaesTsai, WilmanWilmanTsaiDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7487Atomic layer deposition and remote plasma surface preparation for gate stack applicationsProceedings paper