Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images

Patsis, G.P.G.P.PatsisConstantoudis, V.V.ConstantoudisTserepi, A.A.TserepiGogolides, E.E.GogolidesGrozev, GrozdanGrozdanGrozev2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7984Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy imagesJournal article