Effective reduction of interfacial traps in Al2O3 /GaAs(001) gate stacks using surface engineering and thermal annealing

Chang, Yao-ChungYao-ChungChangMerckling, ClementClementMercklingPenaud, JulienJulienPenaudLu, Chung-YuChung-YuLuWang, Wei-EWei-EWangDekoster, JohanJohanDekosterMeuris, MarcMarcMeurisCaymax, MattyMattyCaymaxHeyns, MarcMarcHeynsKwo, RaynienRaynienKwoHong, MinghweiMinghweiHong2021-10-182021-10-1820100003-6951https://imec-publications.be/handle/20.500.12860/16840Effective reduction of interfacial traps in Al2O3 /GaAs(001) gate stacks using surface engineering and thermal annealingJournal article