Sub nanometer depth resolution profiling of the evolution and annealing of damage and the dopant redistribution of ultra-shallow As and Sb implants in Si

van den Berg, J.A.J.A.van den BergWerner, M.M.WernerArmour, D.G.D.G.ArmourVandervorst, WilfriedWilfriedVandervorstClarysse, TrudoTrudoClarysseCollart, E.H.J.E.H.J.CollartGoldberg, R.D.R.D.GoldbergBailey, P.P.BaileyNoakes, T.C.T.C.Noakes2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8255Sub nanometer depth resolution profiling of the evolution and annealing of damage and the dopant redistribution of ultra-shallow As and Sb implants in SiMeeting abstract