Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography

Fallica, RobertoRobertoFallicaDe Simone, DaniloDaniloDe SimoneChen, StevenStevenChenSafdar, MuhammadMuhammadSafdarSuh, Hyo SeonHyo SeonSuh2023-03-232023-03-012023-03-052023-03-2320221932-5150WOS:000924949300027https://imec-publications.be/handle/20.500.12860/41206Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithographyJournal article10.1117/1.JMM.21.4.044601WOS:000924949300027Materials scienceextreme ultraviolet; extreme ultraviolet lithography; high-numerical aperture; underlayer; photoresist; scaling; numerical aperture; lithographyEUV