Job, R.R.JobUlyashin, A.G.A.G.UlyashinHuang, Y.L.Y.L.HuangFahrner, W.R.W.R.FahrnerSimoen, EddyEddySimoenClaeys, CorCorClaeysNiedernostheide, F.-J.F.-J.NiedernostheideSchulze, H.-J.H.-J.SchulzeTonelli, G.G.Tonelli2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6443Doping of oxidized float zone silicon by thermal donors- a low thermal budget doping method for device applications?Proceedings paper