Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography

Bogaerts, WimWimBogaertsWiaux, VincentVincentWiauxTaillaert, DirkDirkTaillaertBeckx, StephanStephanBeckxLuyssaert, BertBertLuyssaertBienstman, P.P.BienstmanBaets, RoelRoelBaets2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6047Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithographyJournal article