Correlation between stress-induced leakage current (SILC) and the HfO2 bulk trap density in a SiO2/HfO2 stack

Crupi, FeliceFeliceCrupiDegraeve, RobinRobinDegraeveKerber, AndreasAndreasKerberKwak, Dong HwaDong HwaKwakGroeseneken, GuidoGuidoGroeseneken2021-10-152021-10-152004-04https://imec-publications.be/handle/20.500.12860/8739Correlation between stress-induced leakage current (SILC) and the HfO2 bulk trap density in a SiO2/HfO2 stackProceedings paper