Photoresist challenges for logic and memory using 0.33NA EUV lithography

De Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenberghe2021-10-272021-10-2720190914-9244https://imec-publications.be/handle/20.500.12860/32836Photoresist challenges for logic and memory using 0.33NA EUV lithographyJournal articlehttps://doi.org/10.2494/photopolymer.32.87