Erdmann, AndreasAndreasErdmannEvanschitzky, PeterPeterEvanschitzkyBret, TristanTristanBretJonckheere, RikRikJonckheere2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20658Analysis of EUV mask multilayer defect printing characteristicsProceedings paper