Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on Si3N4 in Sub-50 nanometer Si3N4/amorphous carbon structures

Stevens, EricEricStevensTomczak, YoannYoannTomczakChan, BTBTChanAltamirano Sanchez, EfrainEfrainAltamirano SanchezParsons, GregoryGregoryParsonsDelabie, AnneliesAnneliesDelabie2021-10-262021-10-262018https://imec-publications.be/handle/20.500.12860/31858Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on Si3N4 in Sub-50 nanometer Si3N4/amorphous carbon structuresMeeting abstract