Wet-chemical etching of ruthenium for advanced interconnects

Philipsen, HaroldHaroldPhilipsenMouwen, NilsNilsMouwenTeck, SanderSanderTeckMonnens, WouterWouterMonnensLe, Quoc ToanQuoc ToanLeHolsteyns, FrankFrankHolsteynsStruyf, HerbertHerbertStruyf2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/33793Wet-chemical etching of ruthenium for advanced interconnectsMeeting abstract