Winroth, GustafGustafWinrothRosseel, ErikErikRosseelDelvaux, ChristieChristieDelvauxAltamirano Sanchez, EfrainEfrainAltamirano SanchezErcken, MoniqueMoniqueErcken2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23396Precuring implant photoresists for shrink and patterning controlProceedings paper