Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density

Kohyama, T.T.KohyamaChang, Shu-HaoShu-HaoChangDoise, JanJanDoiseKocsis, MichaelMichaelKocsisDe Schepper, PeterPeterDe SchepperFoubert, PhilippePhilippeFoubert2024-03-072023-07-282024-03-072023978-1-5106-6103-50277-786XWOS:001022961000003https://imec-publications.be/handle/20.500.12860/42241Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect DensityProceedings paper10.1117/12.2657509978-1-5106-6104-2WOS:001022961000003