Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination

Ronse, KurtKurtRonsePforr, RainerRainerPforrBaik, Ki-HoKi-HoBaikJonckheere, RikRikJonckheereVan den hove, LucLucVan den hove2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/317Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized IlluminationJournal article