Poly- silicon etch with diluted ammonia: Application to replacement gate integration scheme

Sebaai, FaridFaridSebaaidel Agua Borniquel, Jose IgnacioJose Ignaciodel Agua BorniquelVos, RitaRitaVosAbsil, PhilippePhilippeAbsilChiarella, ThomasThomasChiarellaVrancken, ChristaChristaVranckenBoelen, PieterPieterBoelenEvans, BaiyaBaiyaEvans2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14456Poly- silicon etch with diluted ammonia: Application to replacement gate integration schemeOral presentation