Atomic Layer Deposition of Boron-Containing Layers Using a Combined Trimethylborate- and Water-Based Plasma

Dhara, ArpanArpanDharaWerbrouck, AndreasAndreasWerbrouckLi, JinJinLiVerhelle, TippiTippiVerhelleMinjauw, Matthias M.Matthias M.MinjauwMeersschaut, JohanJohanMeersschautHenderick, LowieLowieHenderickDendooven, JolienJolienDendoovenDetavernier, ChristopheChristopheDetavernier2025-05-032025-05-032025-APR 20897-4756WOS:001472917200001https://imec-publications.be/handle/20.500.12860/45578Atomic Layer Deposition of Boron-Containing Layers Using a Combined Trimethylborate- and Water-Based PlasmaJournal article10.1021/acs.chemmater.4c03385WOS:001472917200001THIN-FILMSPHOSPHATEEFFICIENTELECTRODE