Modulating the resistivity of MoS2 through low energy phosphorus plasma implantation

Haynes, K.K.HaynesMurray, R.R.MurrayWeinrich, Z.Z.WeinrichZhao, X.X.ZhaoChiappe, DanieleDanieleChiappeSutar, SurajitSurajitSutarRadu, IulianaIulianaRaduHatem, C.C.HatemPerry, SSPerryJones, KKJones2021-10-242021-10-2420170003-6951https://imec-publications.be/handle/20.500.12860/28473Modulating the resistivity of MoS2 through low energy phosphorus plasma implantationJournal articlehttp://aip.scitation.org/doi/full/10.1063/1.4989829