Stochastic printing behavior of non-local mask deficiencies in EUV lithography

Jonckheere, RikRikJonckheereMelvin III, LawrenceLawrenceMelvin III2021-10-282021-10-282020https://imec-publications.be/handle/20.500.12860/35338Stochastic printing behavior of non-local mask deficiencies in EUV lithographyProceedings paperhttps://doi.org/10.1117/12.2572998