Low cost solution-processed high-k gate dielectric materials for large area circuit applications

Lin, Wan-YuWan-YuLinMuller, RobertRobertMullerSteudel, SoerenSoerenSteudelGenoe, JanJanGenoeHeremans, PaulPaulHeremans2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17502Low cost solution-processed high-k gate dielectric materials for large area circuit applicationsOral presentation