Development of a DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier

Zhao, ChaoChaoZhaoDemuynck, StevenStevenDemuynckTokei, ZsoltZsoltTokeiHoriguchi, NaotoNaotoHoriguchiAhn, J.Y.J.Y.Ahn2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14845Development of a DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrierOral presentation