Rodrigues, MicheleMicheleRodriguesMercha, AbdelkarimAbdelkarimMerchaSimoen, EddyEddySimoenCollaert, NadineNadineCollaertClaeys, CorCorClaeysMartino, J.A.J.A.Martino2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16112Impact of TiN metal gate thickness and the HfSiO nitridation on MuGFETs electrical performanceProceedings paper