A new paradigm for in-line detection and control of patterning defects

Hunsche, StefanStefanHunscheJochemsen, MarinusMarinusJochemsenJain, VivekVivekJainZhou, XinjianXinjianZhouChen, FrankFrankChenVellanki, VenuVenuVellankiSpence, ChrisChrisSpenceHalder, SandipSandipHalderVan Den Heuvel, DieterDieterVan Den HeuvelTruffert, VincentVincentTruffert2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25404A new paradigm for in-line detection and control of patterning defectsProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210980