Charley, Anne-LaureAnne-LaureCharleyLeray, PhilippePhilippeLerayPypen, WouterWouterPypenCheng, ShauneeShauneeChengVerma, AlokAlokVermaMattheus, ChristineChristineMattheusWisse, BaukjeBaukjeWisseCramer, HugoHugoCramerNiesing, HenkHenkNiesingKruijswijk, StefanStefanKruijswijk2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23624High speed optical metrology solution for after etch process monitoring and controlProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1859781