Leray, PhilippePhilippeLerayCheng, ShauneeShauneeChengLaidler, DavidDavidLaidlerKandel, DanielDanielKandelAdel, MikeMikeAdelDinu, BertaBertaDinuPolli, MarcoMarcoPolliVasconi, MauriMauriVasconiSalski, BartlomiejBartlomiejSalski2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15700Overlay metrology for double patterning processesProceedings paper