Cui, HuaHuaCuiClaes, MartineMartineClaesSuhard, SamuelSamuelSuhard2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/16922TiN metal hardmask etch residues removal on advanced porous low-k and Cu device with corner rounding schemeMeeting abstract