Graphene oxide monolayers as an atomically thin seeding layers for atomic layer deposition of metal oxides

Nourbakhsh, AmirhasanAmirhasanNourbakhshAdelmann, ChristophChristophAdelmannSong, YiYiSongLee, ChangSeungChangSeungLeeAsselberghs, IngeIngeAsselberghsHuyghebaert, CedricCedricHuyghebaertBrizzi, SimoneSimoneBrizziTallarida, MassimoMassimoTallaridaSchmeisser, DieterDieterSchmeisserVan Elshocht, SvenSvenVan ElshochtHeyns, MarcMarcHeynsKong, JingJingKongPalacios, TomasTomasPalaciosDe Gendt, StefanStefanDe Gendt2021-10-222021-10-2220152040-3364https://imec-publications.be/handle/20.500.12860/25696Graphene oxide monolayers as an atomically thin seeding layers for atomic layer deposition of metal oxidesJournal articlehttp://pubs.rsc.org/en/Content/ArticleLanding/2015/NR/c5nr01128k#!divAbstract