Assessing the performance of two and three dimensional dopant profiling techniques for sub-65nm technologies

Eyben, PierrePierreEybenMody, JayJayModyVemula, Sri CharanSri CharanVemulaKoelling, SebastianSebastianKoellingVerheyden, R.R.VerheydenVandervorst, WilfriedWilfriedVandervorstRaineri, V.V.RaineriGiannazzo, F.F.GiannazzoVerheijen, M.M.VerheijenKim, D.H.D.H.Kim2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12139Assessing the performance of two and three dimensional dopant profiling techniques for sub-65nm technologiesOral presentation