Probing the metal gate high-k interactions by backside XPS and C-AFM

Celano, UmbertoUmbertoCelanoConard, ThierryThierryConardHantschel, ThomasThomasHantschelVandervorst, WilfriedWilfriedVandervorst2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18649Probing the metal gate high-k interactions by backside XPS and C-AFMProceedings paper