Functional water solutions to enable advanced wet cleaning process for next generation semiconductor device manufacturing

Iino, HideakiHideakiIinoTanaka, YoichiYoichiTanakaGan, NobukoNobukoGanFukui, TakeoTakeoFukuiAkanishi, YuyaYuyaAkanishiIwahata, ShotaShotaIwahataOniki, YusukeYusukeOnikiAltamirano Sanchez, EfrainEfrainAltamirano SanchezHolsteyns, FrankFrankHolsteyns2022-04-292021-12-012022-04-292021n/ahttps://imec-publications.be/handle/20.500.12860/38513Functional water solutions to enable advanced wet cleaning process for next generation semiconductor device manufacturingMeeting abstract