Dinh, Cong QueCong QueDinhNagahara, SeijiSeijiNagaharaKuwahara, YuheiYuheiKuwaharaDauendorffer, ArnaudArnaudDauendorfferYoshida, KeisukeKeisukeYoshidaOkada, SoichiroSoichiroOkadaOnitsuka, TomoyaTomoyaOnitsukaKawakami, ShinichiroShinichiroKawakamiShimura, SatoruSatoruShimuraMuramatsu, MakotoMakotoMuramatsuYoshihara, KosukeKosukeYoshiharaPetersen, JohnJohnPetersenDe Simone, DaniloDaniloDe SimoneFoubert, PhilippePhilippeFoubertVandenberghe, GeertGeertVandenbergheHuli, LiorLiorHuliGrzeskowiak, StevenStevenGrzeskowiakKrawicz, AlexandraAlexandraKrawiczBae, NayoungNayoungBaeKato, KanzoKanzoKatoNafus, KathleenKathleenNafusRaley, AngeliqueAngeliqueRaley2023-05-252023-04-302023-05-2520220914-9244WOS:000960586000014https://imec-publications.be/handle/20.500.12860/41520EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume ManufacturingJournal article10.2494/photopolymer.35.87WOS:000960586000014