Atomic layer etching of InGaZnO thin films via plasma hydrocarbonation and oxygen radical reaction

Li, JieJieLiKundu, ShreyaShreyaKunduSouriau, LaurentLaurentSouriauBelmonte, AttilioAttilioBelmonteDevriendt, KatiaKatiaDevriendt2025-08-182025-08-182025-AUG 10963-0252WOS:001546486800001https://imec-publications.be/handle/20.500.12860/46089Atomic layer etching of InGaZnO thin films via plasma hydrocarbonation and oxygen radical reactionJournal article10.1088/1361-6595/adf667WOS:001546486800001RAY PHOTOELECTRON-SPECTROSCOPYGALLIUM-ZINC-OXIDEINDIUM